Condensate Polishing is normally applied to the treatment of condensed steam from turbines operating in the power industry. It is a specialty application where ion exchange resins are used for removal of corrosion transport products as well as removal of trace ionic impurities. This requires the use of resins that have excellent filtration characteristics as well as ion exchange capacity, and that can withstand the high temperatures and flow rates encountered in condensate systems.
      Polishing resins must also have low levels of both organic and ionic impurities such that they do not leach any objectionable contaminants into the treated water.
      Bojietech offers a variety of coarse grade and uniform particle size resins specifically for condensate polishing, including highly crosslinked resins with excellent thermal stability. These resins are available in a variety of ionic forms such as ammonia and amine forms for cation resin and hydroxide form for anion resin, suitable for immediate use without preconditioning or regeneration.

high capacity highly regenerated, low sodium hydrogen form cation resin.
uniform particle size high capacity highly regenerated, low sodium hydrogen form cation resin.
CP991H  
high crosslinked highly regenerated, low sodium hydrogen form cation resin.
uniform particle size highly regenerated, low sodium hydrogen form cation resin.
Hydroxide form porous anion resin with low chloride residual and lowest possible TOC.
CPM91H  
High crosslinked highly regenerated, low sodium hydrogen form cation resin.
CPM92H  
Uniform particle size high crosslinked highly regenerated, low sodium hydrogen form cation resin.
Hydroxide form uniform particle size anion resin with low chloride residual and lowest possible TOC.
Hydroxide form high crosslinked anion resin with low chloride residual and lowest possible TOC.
Hydroxide form uniform particle size high crosslinked anion resin with low chloride residual and lowest possible TOC.
CPM87  
Highest capacity lowest TOC mixed bed intended for final polishing in secondary loops.
Highest capacity lowest TOC uniform particle size mixed bed intended for final polishing in secondary loops.
High capacity low TOC mixed bed intended for use in primary loops that are frequently regenerated.
High capacity low TOC uniform particle size mixed bed intended for use in primary loops that are frequently regenerated.
Special inert polymer beads intended for tri bed systems as a buffer between cation and anion resin layers during regeneration.